Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 The typical flow for resist spinning is divided in 3 steps: video, spinning and soft bake.
-You need to create the separated recipe for each station an then collect the recipes in a flow. For video station we have 3 standard recipes for 3 different wafer sizes: 2inch, 4inch, 6inch. To create a recipe for coater station you need to describe spinning sequence using the predefined functions. Then you create recipe for hotplates after all recipes are created they can be set together in the different flows. It is why we are not recommending the user just change some parameters in the recipe, this change can effect some other flows.
+You need to create a separate recipe for each station and then collect the recipes in a flow. For the video station we have 3 standard recipes for 3 different wafer sizes: 2inch, 4inch, 6inch. To create a recipe for the coater station you need to describe spinning sequence using the predefined functions. Then you create recipe for the hotplates. After all recipes are created they can be set together in the different flows. It is why we are not recommending the user just change some parameters in the recipe, this change can effect some other flows.
 *[[Specific Process Knowledge/Lithography/Coaters/General SSE spinner process information|General SSE spinner process information]]