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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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Recommended parameters for development of different resists.
Recommended parameters for development of different resists.


*'''AZ nLOF'''
*'''AZ nLOF 2020'''
Exposure dose: 16s @ 7 mW/cm2 (2 µm)
Exposure dose: 16s @ 7 mW/cm2 (2 µm)


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