Jump to content

Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

Line 43: Line 43:
|-valign="top"
|-valign="top"
!style="background:#f0f0f0;"|Which wafers are allowed to enter the furnace:  
!style="background:#f0f0f0;"|Which wafers are allowed to enter the furnace:  
| align="center" style="background:#f0f0f0;"|'''A1 Boron drive-in'''
| align="center" style="background:#f0f0f0;"|'''A1 <br />Boron drive-in'''
| align="center" style="background:#f0f0f0;"|'''A3 Phosphorous drive-in'''
| align="center" style="background:#f0f0f0;"|'''A3 <br />Phosphorous drive-in'''
| align="center" style="background:#f0f0f0;"|'''C1 Gate oxide'''
| align="center" style="background:#f0f0f0;"|'''C1 <br />Gate oxide'''
| align="center" style="background:#f0f0f0;"|'''C2 Anneal oxide'''
| align="center" style="background:#f0f0f0;"|'''C2 <br />Anneal oxide'''
| align="center" style="background:#f0f0f0;"|'''C3 Anneal bond'''
| align="center" style="background:#f0f0f0;"|'''C3 <br />Anneal bond'''
| align="center" style="background:#f0f0f0;"|'''D1 APOX'''
| align="center" style="background:#f0f0f0;"|'''D1 <br />APOX'''
| align="center" style="background:#f0f0f0;"|'''Noble'''
| align="center" style="background:#f0f0f0;"|'''Noble'''
|-
|-