Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-3: Difference between revisions

Revision as of 14:28, 17 January 2017

**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
8/1-2015	4" Wafer with travkaXX mask	AZ standard	Si / XX %	Pegasus/jmli	10 minute TDESC clean	danchip/jml/showerhead/prD/PrD-3, 150 cyc or 8:48 mins	S004781	New showerhead

Revision as of 17:09, 19 January 2015 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,400 edits Created page with " {\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" \|+ '''Process runs''' \|- ! rowspan="2" width="40"\| Date ! colspan="4" width="120"\| Substrate Informat..."		Revision as of 14:28, 17 January 2017 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,400 edits No edit summary Newer edit →
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