Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI: Difference between revisions

Revision as of 10:33, 27 June 2017

**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
15/12-2014	4" Wafer with travka65 mask	AZ standard	Si / 65 %	Pegasus/jmli	10 minute TDESC clean	danchip/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins	S004745	New showerhead

Revision as of 15:18, 16 January 2015 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,416 edits No edit summary ← Older edit		Revision as of 10:33, 27 June 2017 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,416 edits No edit summary Newer edit →
Line 1:		Line 1:

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''