Jump to content

Specific Process Knowledge/Lithography/CSAR: Difference between revisions

Tigre (talk | contribs)
No edit summary
Tigre (talk | contribs)
Line 739: Line 739:
! rowspan="4" align="center"| Recipe
! rowspan="4" align="center"| Recipe
| Gasses
| Gasses
| C<sub>4</sub>F<sub>8</sub> sccm, SF<sub>6</sub> sccm
| C<sub>4</sub>F<sub>8</sub> 70 sccm, SF<sub>6</sub> 38 sccm
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 60s with recipe 'ProcessC'
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 60s with recipe 'ProcessC'
  [[File:tigre 6.17 0% 3b_ 07.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]]
  [[File:tigre 6.17 0% 3b_ 07.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]]
Line 745: Line 745:
|-
|-
| Pressure
| Pressure
| mTorr,  
| 4 mTorr,  
Strike:  secs @  mTorr
Strike:  secs @  mTorr


|-
|-
| Power
| Power
|  W Coil Power, W Platen Power
450 W Coil Power, 100 W Platen Power
|-  
|-  
|Platen temperature
|Platen temperature
20°C
10°C
|-
|-