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| |} | | |} |
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| {| class = "collapsible collapsed" width=100% style = "border-radius: 6px; -moz-border-radius: 10px; -webkit-border-radius: 10px; -khtml-border-radius: 10px; -icab-border-radius: 10px; -o-border-radius: 10px; border: 3px solid #000000;"
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| ! width=15%|
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| ! colspan="4"| SEM inspection of wafer 4.09, 15 nm exposed pattern, shot pitch 5 nm
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| |-
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| ! 253 [muC/cm2]
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| | [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]]
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| | [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]]
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| |[[File:15nmShot10.png|250px]]
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| |-
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| |-
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| ! 276 [muC/cm2]
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| | [[File:53nmCSAR15nmOverviewBasedose+20%.png|250px]]
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| | [[File:53nmCSAR15nmLinesBasedose+20%.png|250px]]
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| |-
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| |}
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