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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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! width=15%|
! width=15%|
! colspan="4"|  SEM inspection of wafer 4.09, 20 nm exposed pattern, shot pitch 5 nm
! colspan="4"|  SEM inspection of wafer 4.09, 20 nm exposed pattern, shot pitch 5 nm
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! 230 [muC/cm2]
| [[File:53nmCSAR20nmOverviewBasedose.png|220px]]
| [[File:53nmCSAR20nmLinesBasedose.png|220px]]
| [[File:20nmShot10.png|220px]]
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