Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|+style="background:Black; color:White" colspan="4"|'''Etch Tests of CSAR, recipe 'nano1.42', DRIE PEGASUS, A-1''' | |+style="background:Black; color:White" colspan="4"|'''Etch Tests of CSAR, recipe 'nano1.42', DRIE PEGASUS, A-1. CSAR thickness measured on Ellipsometer VASE at 70 degrees''' | ||
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!rowspan=" | !rowspan="1"|Sample | ||
!colspan="1"|Etch rate nm/min | !colspan="1"|CSAR Etch rate nm/min | ||
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|Full 4" Si wafer with non-patterned ~180 nm CSAR | |Full 4" Si wafer with non-patterned ~180 nm CSAR | ||