Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 819: / Line 819: @@
 |Duration
 |2.5 s
-|rowspan="16" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'nano1.42'
+|rowspan="16" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 6:00 minutes with recipe 'NBoost01'
-  [[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]]
+  [[File:tigre 6.17 -15% 3a_ 11.png|400px]] [[File:tigre 6.17 3a_ 08.png|400px]]
-  [[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]]
+  [[File:tigre 6.17 3a_ 20.png|400px]] [[File:tigre 6.17 3a_ 21.png|400px]]
+ [[File:tigre 6.17 3a_ 22.png|400px]]
 |-
 | width ="30"| Gasses