Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 815: | Line 815: | ||
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! rowspan=" | ! rowspan="9" align="center"| Recipe | ||
| rowspan="3"| Deposition step | |||
| Gasses | | Gasses | ||
|C<sub>4</sub>F<sub>8</sub> 50 sccm, SF<sub>6</sub> 0 sccm | |||
|- | |||
| Pressure | |||
|10 mTorr | |||
|- | |||
| Powers | |||
|500 W Coil | |||
|- | |||
| rowspan="3"| Deposition step | |||
| Gasses | |||
|C<sub>4</sub>F<sub>8</sub> 50 sccm, SF<sub>6</sub> 0 sccm | |||
|- | |||
| Pressure | |||
|10 mTorr | |||
|- | |||
| Powers | |||
|500 W Coil | |||
|- | |||
| rowspan="3"| Deposition step | |||
| Gasses | |||
|C<sub>4</sub>F<sub>8</sub> 50 sccm, SF<sub>6</sub> 0 sccm | |||
|- | |||
| Pressure | |||
|10 mTorr | |||
|- | |||
| Powers | |||
|500 W Coil | |||
|- | |||
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched minutes with recipe '' | |rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched minutes with recipe '' | ||