Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'nano1.42' | |rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'nano1.42' | ||
[[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]] | [[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]] | ||
[[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]] | [[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]] | ||
|- | |- | ||
| Pressure | | Pressure | ||
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[[File:tigre 6.17 0% 3b_ 07.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]] | [[File:tigre 6.17 0% 3b_ 07.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]] | ||
[[File:tigre 6.17 0% 3b_ 14.png|200px]] [[File:tigre 6.17 0% 3b_ 11.png|200px]] | [[File:tigre 6.17 0% 3b_ 14.png|200px]] [[File:tigre 6.17 0% 3b_ 11.png|200px]] | ||
|- | |- | ||
| Pressure | | Pressure | ||