Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 774: | Line 774: | ||
| Gasses | | Gasses | ||
| C<sub>4</sub>F<sub>8</sub> sccm, SF<sub>6</sub> sccm | | C<sub>4</sub>F<sub>8</sub> sccm, SF<sub>6</sub> sccm | ||
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe '' | |rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'ProcessC' | ||
[[File:tigre 6.17 0% 3b_ 11.png|400px]] [[File:tigre 6.17 0% 3b_ 14.png|400px]] [[File:tigre 6.17 0% 3b_ 16.png|400px]] [[File:tigre 6.17 0% 3b_ 07.png|400px]] | |||
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