Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 754: | Line 754: | ||
| Si | | Si | ||
| | | | ||
500 nm lines: ~ | 500 nm lines: ~200 nm/min <br> | ||
190 nm lines: ~ | 190 nm lines: ~200 nm/min <br> | ||
102 nm lines: ~ | 102 nm lines: ~190 nm/min <br> | ||
61 nm lines: ~ | 61 nm lines: ~170 nm/min | ||
|- | |- | ||
|CSAR | |CSAR | ||