Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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!colspan="7"|AllResist AR-P 6200 | !colspan="7"|AllResist AR-P 6200 (> 2ml per 4" wafer) spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC. | ||
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!colspan="7"|AllResist CSAR on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC. | !colspan="7"|AllResist CSAR (< 2ml per 4" wafer) on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC. | ||
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!colspan="7"|AllResist CSAR 1:1 in anisole, Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC. | !colspan="7"|AllResist CSAR 1:1 in anisole (< 2ml per 4" wafer), Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC. | ||
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