Specific Process Knowledge/Lithography/CSAR: Difference between revisions
Appearance
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|-style="background:Black; color:White" | |-style="background:Black; color:White" | ||
!colspan="7"| | !colspan="7"|wafer 9.19 Contrast Curve, Processed by TIGRE, Dec-Jan 2014-2015 | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Spin | !Resist | ||
! | !Spin Coat | ||
! | !E-beam exposure | ||
! | !Development | ||
!Characterisation | |||
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