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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|-style="background:Black; color:White"
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!colspan="7"|AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC.
!colspan="7"|wafer 9.19 Contrast Curve, Processed by TIGRE, Dec-Jan 2014-2015
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Spin Speed [rpm]
!Resist
!Acceleration [1/s2]
!Spin Coat
!Thickness [nm]
!E-beam exposure
!St Dev
!Development
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!Characterisation
 
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|-style="background:WhiteSmoke; color:black"
|2000
|4000
|225.98
|0.97
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|-style="background:WhiteSmoke; color:black"
|3000
|4000
|194.00
|0.6
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|-style="background:WhiteSmoke; color:black"
|4000
|4000
|169.57
|0.32
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|-
|-style="background:WhiteSmoke; color:black"
|5000
|4000
|151.47
|0.26
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|-style="background:Silver; color:black"
|6000
|4000
|142.38
|0.41
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