Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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100 nm lines in ~145 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) with and without agitation at room temperature and at 5 degrees Celsius. Furthermore, same pattern ahs been developed with N50 (standard developer for ZEP520A). | 100 nm lines in ~145 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) with and without agitation at room temperature and at 5 degrees Celsius. Furthermore, same pattern ahs been developed with N50 (standard developer for ZEP520A). | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 40%" | |||
|- | |||
|- | |||
|-style="background:Black; color:White" | |||
!colspan="7"|AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC. | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!Spin Speed [rpm] | |||
!Acceleration [1/s2] | |||
!Thickness [nm] | |||
!St Dev | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|2000 | |||
|4000 | |||
|225.98 | |||
|0.97 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|3000 | |||
|4000 | |||
|194.00 | |||
|0.6 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|4000 | |||
|4000 | |||
|169.57 | |||
|0.32 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|5000 | |||
|4000 | |||
|151.47 | |||
|0.26 | |||
|- | |||
|- | |||
|-style="background:Silver; color:black" | |||
|6000 | |||
|4000 | |||
|142.38 | |||
|0.41 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|7000 | |||
|4000 | |||
|126.59 | |||
|0.36 | |||
|- | |||
|} | |||
[[File:ContrastCurvesCSAR.png|500px]] | [[File:ContrastCurvesCSAR.png|500px]] | ||