Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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100 nm lines in ~145 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) with and without agitation at room temperature and at 5 degrees Celsius. Furthermore, same pattern ahs been developed with N50 (standard developer for ZEP520A). | 100 nm lines in ~145 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) with and without agitation at room temperature and at 5 degrees Celsius. Furthermore, same pattern ahs been developed with N50 (standard developer for ZEP520A). | ||
[[File:ContrastCurvesCSAR.png| | [[File:ContrastCurvesCSAR.png|500px]] | ||
[[File:w919sa-d.png| | [[File:w919sa-d.png|500px]] | ||
== Dosetests == | == Dosetests == | ||