Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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*[[Specific Process Knowledge/Lithography/Coaters/SSE Spinner AZ5214e coating|AZ5214E coating on SSE Spinner]] | *[[Specific Process Knowledge/Lithography/Coaters/SSE Spinner AZ5214e coating|AZ5214E coating on SSE Spinner]] | ||
''Flow names, process parameters, and test results:'' | |||
*'''DCH 100mm 1,5µm AZ5214e''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
!Substrate | |||
!Thickness | |||
!Uniformity (+/-) | |||
!Test date | |||
!Tester initials | |||
!Comments | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|1,415 | |||
|5% | |||
|18/12 2014 | |||
|chasil | |||
|with HMDS. Average of 5 wafers | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||