Specific Process Knowledge/Etch/Etching of Gold: Difference between revisions
| Line 1: | Line 1: | ||
==Etching of Gold== | ==Etching of Gold== | ||
[[Image:fumehoodetch-gold.jpg |300x300px|thumb|Wet Gold Etch: | [[Image:fumehoodetch-gold.jpg |300x300px|thumb|Wet Gold Etch: Done in the fumehood positioned in cleanroom 2]] | ||
Etching of Gold is done wet at Danchip making your own set up in a beaker in the fumehood. We have two different solutions: | Etching of Gold is done wet at Danchip making your own set up in a beaker in the fumehood. We have two different solutions: | ||
# Iodine etch: KI:I<math>_2</math>:H<math>_2</math>O - 100g:25g:500ml - standard at Danchip. Can be used with resist as mask. | # Iodine etch: KI:I<math>_2</math>:H<math>_2</math>O - 100g:25g:500ml - standard at Danchip. Can be used with AZ resist as mask. | ||
# Aqua Regia (Kongevand): HNO<math>_3</math>:HCl - 1:3 - | # Aqua Regia (Kongevand): HNO<math>_3</math>:HCl - 1:3 - A very strong acid witch will etch most metals and are therefore used when you wish to remove all the gold from your wafer. '''you have to be very carefull when you work with Aqua Regia (Kongevand) It can generate nitrous gases witch are very toxic!!''' | ||