Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
Appearance
| Line 79: | Line 79: | ||
! width="100" | Key words | ! width="100" | Key words | ||
|- | |- | ||
! rowspan="7" | | ! rowspan="7" | Process A <!-- recipe name --> | ||
! | ! Step 1 <!-- step --> | ||
| | | 20 <!-- chiller temp --> | ||
! | ! 4 <!-- dep time --> | ||
| | | 25 <!-- dep pressure --> | ||
| | | 200 <!-- C4F8 flow --> | ||
| 0 <!-- SF6 flow --> | | 0 <!-- SF6 flow --> | ||
| 0 <!-- O2 flow --> | | 0 <!-- O2 flow --> | ||
| | | 2000 <!-- coil power --> | ||
| | | 7.0 <!-- etch time --> | ||
| | | 25(1.5s) 90>>150 <!-- etch pressure --> | ||
| | | 0 <!-- C4F8 flow --> | ||
| | | 350(1.5s) 550 <!-- SF6 flow --> | ||
| 5 <!-- O2 flow --> | | 5 <!-- O2 flow --> | ||
| | | 2800 <!-- coil power --> | ||
| | | 120>>140(1.5s) 45 <!-- platen power --> | ||
! Old <!-- Showerhead --> | ! Old <!-- Showerhead --> | ||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ | | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]] <!-- link processes --> | ||
| | | <!-- keywords --> | ||
|- | |- | ||
| polySi etch DUV mask <!-- step --> | | polySi etch DUV mask <!-- step --> | ||