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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

Jmli (talk | contribs)
Jmli (talk | contribs)
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! width="100" | Key words
! width="100" | Key words
|-
|-
! rowspan="7" | Polysilicon etch   <!-- recipe name -->
! rowspan="7" | Process A   <!-- recipe name -->
! polySi etch DUV mask  <!-- step -->
! Step 1 <!-- step -->
| 30       <!-- chiller temp -->
| 20       <!-- chiller temp -->
! 2.3       <!-- dep time -->
! 4       <!-- dep time -->
| 10       <!-- dep pressure -->
| 25       <!-- dep pressure -->
| 50       <!-- C4F8 flow -->
| 200       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 600       <!-- coil power -->
| 2000       <!-- coil power -->
| 5.0      <!-- etch time -->
| 7.0      <!-- etch time -->
| 10       <!-- etch pressure -->
| 25(1.5s) 90>>150       <!-- etch pressure -->
| 20       <!-- C4F8 flow -->
| 0       <!-- C4F8 flow -->
| 60       <!-- SF6 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 400       <!-- coil power -->
| 2800       <!-- coil power -->
| 40     <!-- platen power -->
| 120>>140(1.5s) 45     <!-- platen power -->
! Old      <!-- Showerhead -->
! Old      <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| Slightly over-etching to ensure complete absence of grass  <!-- keywords -->
|   <!-- keywords -->
|-
|-
| polySi etch DUV mask  <!-- step -->
| polySi etch DUV mask  <!-- step -->