Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/Crystal Settings: Difference between revisions

From LabAdviser
Newer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,018 edits
Created page with "{| border="1" style="text-align: center;" |- |colspan="6" style="text-align: center;" style="background: #efefef;" | '''Settings for Crystal thickness monitor 1''' |- !scope..."
 
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,018 edits
No edit summary
Line 39: Line 39:
|}
|}


 
{| border="1" style="text-align: center;"
{| border="1" style="text-align: center; width: 320px; height: 200px;"
|-
|-


Line 46: Line 45:


|-
|-
!scope="row" | 
!scope="row" |Date
!|1
!|Tooling factor: TiO<sub>2</sub>
!|2
!|Tooling factor: SiO<sub>2</sub>
!|3
!|Tooling factor: Si
!|4
!|5
 
|-
|-




|-
|-
!A
!22-7-2014
|A1
|1.573 (wafer center)
|A2
|
|A3
|
|A4
|A5
|-
|-
|-
|-
Line 69: Line 63:
|B2
|B2
|B3
|B3
|B4
 
|B5
|-
|-
|-
|-
Line 77: Line 70:
|C2
|C2
|C3
|C3
|C4
 
|C5
|-
|-
!D
!D
Line 84: Line 76:
|D2
|D2
|D3
|D3
|D4
 
|D5
|}
|}

Revision as of 11:50, 12 December 2014

Settings for Crystal thickness monitor 1
Date Tooling factor: TiO2 Tooling factor: SiO2 Tooling factor: Si
22-7-2014 1.573 (wafer center)
B B1 B2 B3
C C1 C2 C3
D D1 D2 D3
Settings for Crystal thickness monitor 2
Date Tooling factor: TiO2 Tooling factor: SiO2 Tooling factor: Si
22-7-2014 1.573 (wafer center)
B B1 B2 B3
C C1 C2 C3
D D1 D2 D3
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/Crystal_Settings&oldid=17554"