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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly1: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
No edit summary
Line 23: Line 23:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| danchip/showerhead/Cpoly1, 20 cycles or 2:04 minutes  
| S004724
| S004724
| New showerhead  
| New showerhead  
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