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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
No edit summary
Line 43: Line 43:
| danchip/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| danchip/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| S004675
| S004675
|
! New showerhead
|  
|  


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