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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 80: Line 80:
|-
|-
! rowspan="7" | Polysilicon etch    <!-- recipe name -->
! rowspan="7" | Polysilicon etch    <!-- recipe name -->
! Original  <!-- step -->
! polySi etch DUV mask  <!-- step -->
| 30      <!-- chiller temp -->
| 30      <!-- chiller temp -->
! 2.3      <!-- dep time -->
! 2.3      <!-- dep time -->
Line 97: Line 97:
| Old      <!-- Showerhead -->
| Old      <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
|    <!-- keywords -->
| Slightly over-etching to ensure complete absence of grass   <!-- keywords -->
|-
|-
| Original  <!-- step -->
| polySi etch DUV mask  <!-- step -->
| 30      <!-- chiller temp -->
| 30      <!-- chiller temp -->
| 2.3      <!-- dep time -->
| 2.3      <!-- dep time -->
Line 114: Line 114:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| Old       <!-- Showerhead -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
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