Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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| [[file:S004679 edge.jpg |250px|frameless ]]
| [[file:S004679 edge.jpg |250px|frameless ]]
|-
|-
! rowspan="2" width="100"| Switched etch of 1.8 µm polysilicon on BOX patterned with DUV
! rowspan="2" width="100"|  
| rowspan="2" width="100"| 50 cycles, 30 degrees,  2.3/5 secs, 10/10 mtorr, 0/60 sccm SF<sub>6</sub>, 0/5 sccm O<sub>2</sub>, 50/20 sccm C<sub>4</sub>F<sub>8</sub>, 600/400 W coil, 0/40 W platen
| rowspan="2" width="100"|  
| S004593
| S00XXX
| 6" wafer
| 8" wafer
|[[file:S00459305.jpg|80px|frameless ]] [[file:S00459306.jpg|80px|frameless ]] [[file:S00459307.jpg|80px|frameless ]]
|
 
| S00XXX
[[file:S00459308.jpg|80px|frameless ]] [[file:s004593-01.jpg|80px|frameless ]] [[file:s004593-02.jpg|80px|frameless ]]
 
[[file:s004593-03.jpg|80px|frameless ]] [[file:s004593-04.jpg|80px|frameless ]]
| S004679
| Wafer centre
| Wafer centre
| [[file:S004679 centre.jpg |250px|frameless ]]
| [[file:S00XX centre.jpg |250px|frameless ]]
|-
|-
| S004593
| S00XXXx
| Wafer edge
| Wafer edge
| [[file:S004592 edge.jpg |250px|frameless ]]
| [[file:S00XXX dge.jpg |250px|frameless ]]
| S004679
| S00XXX
| Wafer edge
| Wafer edge
| [[file:S004679 edge.jpg |250px|frameless ]]
| [[file:S00xxxx edge.jpg |250px|frameless ]]
|-
|-
|}
|}


= Comparison of switched processes =  
= Comparison of switched processes =  

Revision as of 12:27, 11 December 2014

Comparison of continuous processes

Process Before After
Name/Type Description Wafer ID Comment SEM images Wafer ID Comment SEM images
Continuous black silicon recipe on blank wafer 15 mins, -10 degrees, 32 mtorr, 60 sccm SF6, 55 sccm O2, 70 W platen S004592 Wafer centre S004679 Wafer centre
S004592 Wafer edge S004679 Wafer edge
S00XXX 8" wafer S00XXX Wafer centre File:S00XX centre.jpg
S00XXXx Wafer edge File:S00XXX dge.jpg S00XXX Wafer edge File:S00xxxx edge.jpg

Comparison of switched processes

Recipe description Name Temp. Deposition step Etch step Comments
Time Pres. C4F8 SF6 O2 Coil Time Pres. C4F8 SF6 O2 Coil Platen Showerhead Runs Key words
Polysilicon etch Original 30 2.3 10 50 0 0 600 5.0 10 20 60 5 400 40 Old 1
Cpoly1 30 1.2 10 50 0 0 600 5.0 10 20 60 5 400 40 New 1
Cpoly2 30 1.4 10 50 0 0 600 5.0 10 20 60 5 400 40 New 1
Cpoly3 30 1.6 10 50 0 0 600 5.0 10 20 60 5 400 40 New 1
Cpoly4 30 1.8 10 50 0 0 600 5.0 10 20 60 5 400 40 New 1
Cpoly5 30 2.0 10 50 0 0 600 5.0 10 20 60 5 400 40 New 1
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