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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Line 100: Line 100:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| Old       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
Line 119: Line 119:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly1 | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly1 | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
Line 138: Line 138:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly2 | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly2 | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
Line 157: Line 157:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly3 | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly3 | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
Line 176: Line 176:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly4 | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly4 | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
Line 195: Line 195:
| 400      <!-- coil power -->
| 400      <!-- coil power -->
| 40      <!-- platen power -->
| 40      <!-- platen power -->
| -       <!-- hardware setting -->
| New       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly5 | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly5 | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
|-
|-
|}
|}
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