Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
| Line 80: | Line 80: | ||
! Coil | ! Coil | ||
! Platen | ! Platen | ||
| Hardware | | Hardware | ||
! Runs | ! Runs | ||
! width="100" | Key words | ! width="100" | Key words | ||
|- | |- | ||
! rowspan="6" | Polysilicon etch <!-- recipe name --> | ! rowspan="6" | Polysilicon etch <!-- recipe name --> | ||
! Original | ! Original <!-- step --> | ||
| 30 <!-- chiller temp --> | | 30 <!-- chiller temp --> | ||
! 2.3 <!-- dep time --> | ! 2.3 <!-- dep time --> | ||