Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 123: Line 123:
The showerhead that distributes the process gasses inside the plasma source has been changed. With the new design the gas flow resistance in the gas line from MFC to plasma has been reduced. This has no impact on processes that have a continuous gas flow - i.e. processes that are not switched but for processes with several gas flows that switch on and off, the siwtching from one gas flow to another will be much more well defined. This enables us to run Bosch processes with shorter cycles times. Shorter cycles times means smaller scallops and hence lower roughness.
The showerhead that distributes the process gasses inside the plasma source has been changed. With the new design the gas flow resistance in the gas line from MFC to plasma has been reduced. This has no impact on processes that have a continuous gas flow - i.e. processes that are not switched but for processes with several gas flows that switch on and off, the siwtching from one gas flow to another will be much more well defined. This enables us to run Bosch processes with shorter cycles times. Shorter cycles times means smaller scallops and hence lower roughness.


As states, we believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]] or the black silicon recipes are not believed to be noticeably affected.
As states, we believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]], barc etches or the black silicon recipes are not believed to be noticeably affected.


Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|here]] to see a comparison of some the etches before and after the change of the showerhead.
Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|here]] to see a comparison of some the etches before and after the change of the showerhead.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus"