Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;" | |||
|+ '''Switched etch of 1.8 µm polysilicon on BOX patterned with DUV''' | |||
|- | |||
! rowspan="2" width="100"| Recipe | |||
! rowspan="2" width="20"| Step | |||
! rowspan="2" width="20"| Temp. | |||
! colspan="6" | Deposition step | |||
! colspan="7" | Etch step | |||
! colspan="3" | Process observations | |||
|- | |||
! Time | |||
! Pres. | |||
! C<sub>4</sub>F<sub>8</sub> | |||
! SF<sub>6</sub> | |||
! O<sub>2</sub> | |||
! Coil | |||
! Time | |||
! Pres. | |||
! C<sub>4</sub>F<sub>8</sub> | |||
! SF<sub>6</sub> | |||
! O<sub>2</sub> | |||
! Coil | |||
| [[Main Page/Process Logs/jmli/Parameters#Platen power|Platen]] | |||
| [[Main Page/Process Logs/jmli/Parameters#Hardware | HW]] | |||
! Runs | |||
! width="100" | Key words | |||
|- | |||
! - <!-- recipe name --> | |||
| <!-- step --> | |||
| <!-- chiller temp --> | |||
| <!-- dep time --> | |||
| <!-- dep pressure --> | |||
| <!-- C4F8 flow --> | |||
| <!-- SF6 flow --> | |||
| <!-- O2 flow --> | |||
| <!-- coil power --> | |||
| <!-- etch time --> | |||
| <!-- etch pressure --> | |||
| <!-- C4F8 flow --> | |||
| <!-- SF6 flow --> | |||
| <!-- O2 flow --> | |||
| <!-- coil power --> | |||
| <!-- platen power --> | |||
| <!-- hardware setting --> | |||
| <!-- link processes --> | |||
| <!-- keywords --> | |||
|- | |||
! base-A <!-- recipe name --> | |||
| - <!-- step --> | |||
| 30 <!-- chiller temp --> | |||
! 2.3 <!-- dep time --> | |||
| 10 <!-- dep pressure --> | |||
| 50 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 600 <!-- coil power --> | |||
| 5.0 <!-- etch time --> | |||
| 10 <!-- etch pressure --> | |||
| 20 <!-- C4F8 flow --> | |||
| 60 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 400 <!-- coil power --> | |||
| 40 <!-- platen power --> | |||
| - <!-- hardware setting --> | |||
| [[Main Page/Process Logs/jmli/Pegasus/poly/base-A | 1]] <!-- link processes --> | |||
| <!-- keywords --> | |||
|- | |||
! base-B <!-- recipe name --> | |||
| - <!-- step --> | |||
| 30 <!-- chiller temp --> | |||
! 2.15 <!-- dep time --> | |||
| 10 <!-- dep pressure --> | |||
| 50 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 600 <!-- coil power --> | |||
| 5.0 <!-- etch time --> | |||
| 10 <!-- etch pressure --> | |||
| 20 <!-- C4F8 flow --> | |||
| 60 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 400 <!-- coil power --> | |||
| 40 <!-- platen power --> | |||
| - <!-- hardware setting --> | |||
| [[Main Page/Process Logs/jmli/Pegasus/poly/base-B | 1]] <!-- link processes --> | |||
| <!-- keywords --> | |||
|- | |||
! base-C <!-- recipe name --> | |||
| - <!-- step --> | |||
| 30 <!-- chiller temp --> | |||
! 2.15 <!-- dep time --> | |||
| 10 <!-- dep pressure --> | |||
| 50 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 600 <!-- coil power --> | |||
| 5.0 <!-- etch time --> | |||
| 10 <!-- etch pressure --> | |||
| 20 <!-- C4F8 flow --> | |||
| 60 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 400 <!-- coil power --> | |||
| 40 <!-- platen power --> | |||
| - <!-- hardware setting --> | |||
| [[Main Page/Process Logs/jmli/Pegasus/poly/base-B | 1]] <!-- link processes --> | |||
| <!-- keywords --> | |||
|- | |||
|} | |} | ||