Specific Process Knowledge/Thin film deposition: Difference between revisions
| Line 105: | Line 105: | ||
*[[/MVD|MVD]] - ''Molecular Vapor Deposition'' | *[[/MVD|MVD]] - ''Molecular Vapor Deposition'' | ||
*[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel'' | *[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel'' | ||
*[[/Electroplating-Cu|Electroplating-Cu]] - ''Electrochemical deposition of copper'' | |||
*MOCVD - Epitaxial growth - ''Ask the department of photonics if you are interested: [mailto:esem@fotonik.dtu.dk Elizaveta Semenova] or [mailto:kryv@fotonok.dtu.dk Kresten Yvind]'' | *MOCVD - Epitaxial growth - ''Ask the department of photonics if you are interested: [mailto:esem@fotonik.dtu.dk Elizaveta Semenova] or [mailto:kryv@fotonok.dtu.dk Kresten Yvind]'' | ||
|- | |- | ||
|} | |} | ||