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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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No edit summary
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! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer
! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer
! rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen
| rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen
| S004592
| S004592
| Wafer centre
| Wafer centre
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