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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''
|-
! rowspan="2" colspan="2"| Process
! colspan="3"| Before
! colspan="3"| After
|-
! Name
! Description
! Wafer ID
! Comment
! SEM images
! Wafer ID
! Comment
! SEM images
|-
! rowspan="2" width="100"| 15 minutes of black silicon recipe on blank wafer
| S004592
| Wafer centre
| [[file:S004592 centre.jpg |250px|frameless ]]
| S004679
| Wafer centre
| [[file:S004679 centre.jpg |250px|frameless ]]
|-
| S004592
| Wafer edge
| [[file:S004592 edge.jpg |250px|frameless ]]
| S004679
| Wafer edge
| [[file:S004679 edge.jpg |250px|frameless ]]
|-
|}
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''