Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
Line 17: Line 17:
| Wafer centre
| Wafer centre
| [[file:S004592 centre.jpg |150px|frameless ]]
| [[file:S004592 centre.jpg |150px|frameless ]]
| S004592
| S004679
| Wafer centre
| Wafer centre
| [[file:S004679 centre.jpg |150px|frameless ]]
| [[file:S004679 centre.jpg |150px|frameless ]]
Line 24: Line 24:
| Wafer edge
| Wafer edge
| [[file:S004592 edge.jpg |150px|frameless ]]
| [[file:S004592 edge.jpg |150px|frameless ]]
| S004592
| S004679
| Wafer edge
| Wafer edge
| [[file:S004679 edge.jpg |150px|frameless ]]
| [[file:S004679 edge.jpg |150px|frameless ]]
|-
|-
|}
|}

Revision as of 10:07, 4 December 2014

Comparison of processes before and after the change of showerhead in December 2014
Process Before After
Wafer ID Comment SEM images Wafer ID Comment SEM images
rebe g4-14 black silicon recipe S004592 Wafer centre S004679 Wafer centre
S004592 Wafer edge S004679 Wafer edge
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange&oldid=17349"