Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
No edit summary
Line 6: Line 6:
! colspan="3"| After
! colspan="3"| After
|-
|-
! Parameter change
! Wafer ID
! Wafer ID
! Comment
! SEM images
! SEM images
! Wafer ID
! Comment
! Comment
! Wafer ID
! SEM images
! SEM images
|-
|-
Line 19: Line 19:
| S004592
| S004592
| Centre wafer
| Centre wafer
| [[file:S004 centre.jpg |150px|frameless ]]
| [[file:S004679 centre.jpg |150px|frameless ]]




|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange"