Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;" | {| border="1" cellpadding="1" cellspacing="1" style="text-align:center;" | ||
|+ ''' | |+ '''Comparison of processes before and after the change of showerhead in December 2014''' | ||
|- | |- | ||
! rowspan="2"| Process | ! rowspan="2"| Process | ||
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! Wafer ID | ! Wafer ID | ||
! SEM images | ! SEM images | ||
! | ! Comment | ||
! Wafer ID | ! Wafer ID | ||
! SEM images | ! SEM images | ||
|- | |- | ||
! rowspan="2"| rebe g4-14 black silicon recipe | |||
| S004592 | |||
| Centre wafer | |||
| [[file:S004592 centre.jpg |150px|frameless ]] | |||
| S004592 | |||
| Centre wafer | |||
| [[file:S004 centre.jpg |150px|frameless ]] | |||
|} | |} |
Revision as of 10:01, 4 December 2014
Process | Before | After | ||||
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Parameter change | Wafer ID | SEM images | Comment | Wafer ID | SEM images | |
rebe g4-14 black silicon recipe | S004592 | Centre wafer | S004592 | Centre wafer | File:S004 centre.jpg
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