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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
|+ '''Process parameters'''
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''
|-
|-
! rowspan="2"| Process
! rowspan="2"| Process
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! Wafer ID
! Wafer ID
! SEM images
! SEM images
! Parameter change
! Comment
! Wafer ID
! Wafer ID
! SEM images
! SEM images
|-
|-
! rowspan="2"| rebe g4-14 black silicon recipe
| S004592
| Centre wafer
| [[file:S004592 centre.jpg |150px|frameless ]]
| S004592
| Centre wafer
| [[file:S004 centre.jpg |150px|frameless ]]
|}
|}