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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,580 edits
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We believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]] or the black silicon recipes are not believed to be noticeably affected.
We believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]] or the black silicon recipes are not believed to be noticeably affected.


Click
Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|here]] to see a comparison of some the etches before and after the change of the showerhead.


== Additional information ==
== Additional information ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus"