Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
Appearance
| Line 14: | Line 14: | ||
<br clear="all" /> | <br clear="all" /> | ||
<gallery caption="Different places to do anisotropic wet silicon etch" widths=" | <gallery caption="Different places to do anisotropic wet silicon etch" widths="350px" heights="250px" perrow="3"> | ||
image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom D-3. | image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom D-3. | ||
image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom C-1. | image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom C-1. | ||