Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 317: | Line 317: | ||
[[Image:Chip example.png|right|200px]] | [[Image:Chip example.png|right|200px]] | ||
[[Image:P Q marks and chip marks.png|right|250px]] | [[Image:P Q marks and chip marks.png|right|250px]] | ||
| Line 323: | Line 325: | ||
! width="150" | | ! width="150" | | ||
! width="150" | | ! width="150" | | ||
! width="250" | | |||
! width="200" | | |||
|- border="0" | |- border="0" | ||
| [[File:mark example.png|120px]] | | [[File:mark example.png|120px]] | ||
| [[File:mark example2.png|120px]] | | [[File:mark example2.png|120px]] | ||
| [[File:GlobalMark.png|120px]] | | [[File:GlobalMark.png|120px]] | ||
| [[File:P Q marks and chip marks.png|right|250px]] | |||
| [[File:Chip example.png|right|200px]] | |||
|- align="center" | |- align="center" | ||
| Correct mark || Definition of length and width, use L = 500-1000 µm, W 3-5 µm || Text around mark not recommended | | Correct mark || Definition of length and width, use L = 500-1000 µm, W 3-5 µm || Text around mark not recommended | ||