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Specific Process Knowledge/Wafer and sample drying: Difference between revisions
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Revision as of 12:10, 14 November 2014
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Kabi
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Spin dryers
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Revision as of 12:10, 14 November 2014
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Kabi
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Single Wafers Spin Dryers
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Line 149:
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= Single Wafers Spin Dryers =
== Process information ==
Standard process is 120 seconds for 100mm wafers or 180 seconds for 150mm wafers, at 2000 RPM - drying only.
''If'' rinsing is used as well, the standard process is 60 seconds of rinse at 500 RPM, followed by 120/180 seconds of drying at 2000 RPM.
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