Specific Process Knowledge/Wafer and sample drying: Difference between revisions
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'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=156 Spin dryer 1] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=256 Spindryer 4 (4",6")]''' | '''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=156 Spin dryer 1] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=256 Spindryer 4 (4",6")]''' | ||
== Process information == | |||
Standard process is 120 seconds for 100mm wafers or 180 seconds for 150mm wafers, at 2000 RPM - drying only. | |||
''If'' rinsing is used as well, the standard process is 60 seconds of rinse at 500 RPM, followed by 120/180 seconds of drying at 2000 RPM. | |||
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= Single Wafers Spin Dryers = | = Single Wafers Spin Dryers = | ||