Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | |[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | ||
|IPA | |IPA | ||
|Plasma ashing can remove crosslinked | |Plasma ashing can remove crosslinked SU-8 | ||
|[[media:Process_Flow_SU8_70um.docx|Process_Flow_SU8_70um.docx]] | |[[media:Process_Flow_SU8_70um.docx|Process_Flow_SU8_70um.docx]] | ||