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Specific Process Knowledge/Etch/Etching of Titanium: Difference between revisions

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# BHF  
# BHF  
#  
# Cold RCA1 (as stripper)




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!  
!  
! BHF
! BHF
!  
! Cold RCA1
|-  
|-  
|'''General description'''
|'''General description'''
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Etch of titanium with or without photoresist mask.
Etch of titanium with or without photoresist mask.
|
|
Etch of
Etch of titanium (as stripper)
|-
|-
|'''Chemical solution'''
|'''Chemical solution'''
|HF:NH<math>_4</math>F   
|HF:NH<math>_4</math>F   
|.
|NH3OH:H2O2:H2O - 1:1:5
|-
|-
|'''Process temperature'''
|'''Process temperature'''
|Room temperature
|Room temperature
 
|Room temperature
|


|-
|-
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|
|
Photoresist (1.5 µm AZ5214E)
Photoresist (1.5 µm AZ5214E)
|
|None
.
|-
|-
|'''Etch rate'''
|'''Etch rate'''
|
|
?
Not known (it bubbles while etching)
|
|
?
Not known
|-
|-
|'''Batch size'''
|'''Batch size'''
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