Specific Process Knowledge: Difference between revisions
| Line 539: | Line 539: | ||
!Materials | !Materials | ||
|- | |- | ||
|[[Specific Process Knowledge/Etch| Etch]] | |rowspan="2" valign="top"|[[Specific Process Knowledge/Etch| Etch]] | ||
|Wet etch | |Wet etch | ||
|Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs | |Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs | ||
|- | |- | ||
|Dry etch | |Dry etch | ||
|Any material | |Any material | ||