Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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! Batch size | ! Batch size | ||
|max. 30 wafers of 4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 wafers of 6",4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 4" wafers or 2" wafers||max. 200 4"||? | |max. 30 wafers of 4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 wafers of 6",4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 4" wafers or 2" wafers||max. 200 4"||? | ||
|- | |-valign="top" | ||
!style="background:#f0f0f0;"|Which wafers are allowed to enter the furnace: | !style="background:#f0f0f0;"|Which wafers are allowed to enter the furnace: | ||
| align="center" style="background:#f0f0f0;"|'''A1 Boron drive-in''' | | align="center" style="background:#f0f0f0;"|'''A1 Boron drive-in''' | ||