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Specific Process Knowledge/Wafer and sample drying: Difference between revisions

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|style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b>
|style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b>
|style="background:WhiteSmoke; color:black"|<b>Ethanol fume dryer</b>
|style="background:WhiteSmoke; color:black"|<b>Ethanol fume dryer</b>
|style="background:WhiteSmoke; color:black"|<b>N<sub>2\sub guns</b>
|style="background:WhiteSmoke; color:black"|<b>N<sub>2</sub> guns</b>
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!style="background:silver; color:black;" align="center" width="60"|Location
!style="background:silver; color:black;" align="center" width="60"|Location
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*C-1
*C-1
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*In fumehoods and at chemical benches
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!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
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*Drying sensitive samples. E.g. with cantilevers
*Drying sensitive samples. E.g. with cantilevers
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*Drying all kind of samples.
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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*1-25 100 mm wafers
*1-25 100 mm wafers
*Pieces if a suitable carrier is available
*Pieces if a suitable carrier is available
*All kind of samples and wafers
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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
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*No restriction except for polymers
*No restriction except for polymers
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*No restriction
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