Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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*[[/imageoptmisation| Image optimisation]] | *[[/imageoptmisation| Image optimisation]] | ||
*[[/samplecharging| Problems related to sample charging]] | *[[/samplecharging| Problems related to sample charging]] | ||
==Equipment performance and process related parameters== | |||
{| border="2" cellspacing="0" cellpadding="0" | |||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Leo|SEM Leo]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Zeiss|SEM Zeiss]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Supra60VP|SEM Supra 60VP]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/FEI|SEM FEI]] | |||
|style="background:WhiteSmoke; color:black" align="center"|[[/Jeol|SEM Jeol]] | |||
|- | |||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Model | |||
|style="background:WhiteSmoke; color:black" align="center"| Leo 1550 SEM | |||
|style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 40 VP | |||
|style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 60 VP | |||
|style="background:WhiteSmoke; color:black" align="center"| FEI Nova 600 NanoSEM | |||
|style="background:WhiteSmoke; color:black" align="center"| Jeol JSM 5500 LV | |||
|- | |||
!style="background:silver; color:black;" align="center" width="60"|Purpose | |||
|style="background:LightGrey; color:black"| Imaging and measurement of | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any (semi)conducting sample that may have thin (> ~ 5 µm) layers of non-conducting materials on top | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any sample except bulk insulators such as polymers, glass or quartz wafers | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any sample except bulk insulators such as polymers, glass or quartz wafers | |||
|style="background:WhiteSmoke; color:black"| | |||
* All samples | |||
* Bulk insulators such as polymer-, glass or quartz wafers | |||
|style="background:WhiteSmoke; color:black"| | |||
* Samples from the 'real' world outside the lab | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | |||
|style="background:LightGrey; color:black" rowspan="2"|Resolution | |||
|style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples | |||
|- | |||
|style="background:WhiteSmoke; color:black"| | |||
* ~ 5 nanometers (limited by vibrations) | |||
|style="background:WhiteSmoke; color:black"| | |||
* 1-2 nm (limited by vibrations) | |||
|style="background:WhiteSmoke; color:black"| | |||
* 1-2 nm (limited by vibrations) | |||
|style="background:WhiteSmoke; color:black"| | |||
* 1-2 nm (limited by vibrations) | |||
|style="background:WhiteSmoke; color:black"| | |||
* 20 nm (limited by instrument) | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Instrument specifics | |||
|style="background:LightGrey; color:black"|Detectors | |||
|style="background:WhiteSmoke; color:black"| | |||
* Secondary electron (Se2) | |||
* Inlens secondary electron (Inlens) | |||
* Backscatter electron (QBSD) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Secondary electron (Se2) | |||
* Inlens secondary electron (Inlens) | |||
* Backscatter electron (QBSD) | |||
* Variable pressure secondary electron (VPSE) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Secondary electron (Se2) | |||
* Inlens secondary electron (Inlens) | |||
* Backscatter electron (QBSD) | |||
* Variable pressure secondary electron (VPSE) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Secondary electron (ETD) | |||
* Inlens secondary electron (TLD) | |||
* Backscatter electron (BSD) | |||
* Variable pressure secondary electron (LVD) | |||
* High resolution varable pressure secondary (Helix) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Secondary electron (SEI) | |||
* Backscatter electron (BEI) | |||
|- | |||
|style="background:LightGrey; color:black"|Stage | |||
|style="background:WhiteSmoke; color:black"| | |||
* X, Y: 125 × 100 mm | |||
* T: 0 to 90<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: 48 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
* X, Y: 130 × 130 mm | |||
* T: -4 to 70<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: 50 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
* X, Y: 150 × 150 mm | |||
* T: -10 to 70<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: XXX mm | |||
|style="background:WhiteSmoke; color:black"| | |||
* X, Y: 150 × 150 mm | |||
* T: -10 to 60<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: 10 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
* X, Y: 73 × 40 mm | |||
* T: -10 to 90<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: 38 mm | |||
|- | |||
|style="background:LightGrey; color:black"|Electron source | |||
|style="background:WhiteSmoke; color:black"| | |||
* FEG (Field Emission Gun) source | |||
|style="background:WhiteSmoke; color:black"| | |||
* FEG (Field Emission Gun) source | |||
|style="background:WhiteSmoke; color:black"| | |||
* FEG (Field Emission Gun) source | |||
|style="background:WhiteSmoke; color:black"| | |||
* FEG (Field Emission Gun) source | |||
|style="background:WhiteSmoke; color:black"| | |||
* Tungsten filament | |||
|- | |||
|style="background:LightGrey; color:black"|Operating pressures | |||
|style="background:WhiteSmoke; color:black"| | |||
* Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | |||
* Variable at Low vacuum (0.1 mbar-2 mbar) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | |||
* Variable at Low vacuum (0.1 mbar-2 mbar) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | |||
* Variable at Low vacuum (0.1 mbar-2 mbar) | |||
|style="background:WhiteSmoke; color:black"| | |||
* Fixed at High vacuum | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | |||
|style="background:LightGrey; color:black"|Sample sizes | |||
|style="background:WhiteSmoke; color:black"| | |||
* Wafers up to 6" (only full view up to 4") | |||
|style="background:WhiteSmoke; color:black"| | |||
* Up to 6" wafer with full view | |||
|style="background:WhiteSmoke; color:black"| | |||
* Up to 8" wafer with 6" view | |||
|style="background:WhiteSmoke; color:black"| | |||
* Up to 6" wafer with full view | |||
* A 12" wafer holder has been made but it requires special training | |||
|style="background:WhiteSmoke; color:black"| | |||
* Up to 4" wafer | |||
|- | |||
| style="background:LightGrey; color:black"|Allowed materials | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any standard cleanroom material except graphene or CNT samples | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any standard cleanroom material except graphene or CNT samples | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any standard cleanroom material except graphene or CNT samples | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any standard cleanroom material including graphene or CNT samples | |||
|style="background:WhiteSmoke; color:black"| | |||
* Any standard cleanroom material including graphene or CNT samples | |||
* Biological samples | |||
|- | |||
|} | |||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||