Specific Process Knowledge/Characterization: Difference between revisions
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*[[/SEM: Scanning Electron Microscopy |SEM Zeiss Supra 60 VP]] | *[[/SEM: Scanning Electron Microscopy |SEM Zeiss Supra 60 VP]] | ||
*[[/AFM: Atomic Force Microscopy| | *[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | ||
*[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | *[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
Revision as of 12:28, 4 November 2014
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Choose characterization topic
- Element analysis
- Measurement of film thickness and optical constants
- Photoluminescence mapping
- Sample imaging
- Stress measurement
- Wafer thickness measurement
- Topographic measurement
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy