Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
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In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. | |||
<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="220px" heights="220px" perrow="5"> | |||
image:ALD Al2O3 grow rate 150C.jpg| Temperature 150 <sup>o</sup>C. | |||
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C. | |||
image:ALD Al2O3 grow rate 250C.jpg| Temperature 250 <sup>o</sup>C. | |||
image:ALD Al2O3 grow rate 200C.jpg| Temperature 300 <sup>o</sup>C. | |||
image:ALD Al2O3 grow rate 350C.jpg| Temperature 350 <sup>o</sup>C. | |||
</gallery> | |||