Specific Process Knowledge/Wafer and sample drying: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,292 edits
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,142 edits
Line 11: Line 11:
|style="background:WhiteSmoke; color:black"|<b>Spin dryer 4</b>
|style="background:WhiteSmoke; color:black"|<b>Spin dryer 4</b>
|style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b>
|style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b>
|style="background:WhiteSmoke; color:black"|<b>Ethanol Fume dryer</b>
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Location
!style="background:silver; color:black;" align="center" width="60"|Location
Line 24: Line 25:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*D-3
*D-3
|style="background:WhiteSmoke; color:black"|
*C-1
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
Line 36: Line 39:
*Drying
*Drying
*Rinsing + drying
*Rinsing + drying
|style="background:WhiteSmoke; color:black"|
*Drying sensitive samples. E.g. with cantilevers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Drying sensitive samples. E.g. with cantilevers
*Drying sensitive samples. E.g. with cantilevers
Line 55: Line 60:
*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
* Pieces (up to 10x10mm)
* Pieces (up to 10x10mm)
|style="background:WhiteSmoke; color:black"|
*1-25 50 mm wafers
*1-25 100 mm wafers
*Pieces if a suitable carrier is available
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
Line 70: Line 79:
*InAlP, GaAs
*InAlP, GaAs
*SU8
*SU8
|style="background:WhiteSmoke; color:black"|
*No restriction except for polymers
|-  
|-  
|}
|}

Revision as of 15:34, 31 October 2014

Feedback to this page: click here

Drying Comparison Table

Equipment Spin dryer 1 Spin dryer 2 Spin dryer 3 Spin dryer 4 Critical point dryer Ethanol Fume dryer
Location
  • C-1
  • B-1
  • D-3
  • E-5
  • D-3
  • C-1
Purpose
  • Drying
  • Drying
  • Drying
  • Drying
  • Rinsing + drying
  • Drying sensitive samples. E.g. with cantilevers
  • Drying sensitive samples. E.g. with cantilevers
Substrates Batch size
  • 1-25 100 mm wafers
  • 1-25 100 mm wafers
  • 1-25 100 mm wafers
  • 1-25 150 mm wafers
  • ? 50 mm wafers
  • 1-25 100 mm wafers
  • 1-25 150 mm wafers
  • 1 to 5 wafers per run. Sizes: 2”, 4" or 6"
  • Pieces (up to 10x10mm)
  • 1-25 50 mm wafers
  • 1-25 100 mm wafers
  • Pieces if a suitable carrier is available
Allowed materials
  • No restrictions
  • Only for RCA cleaned wafers
  • No restrictions
  • No restrictions
  • Si,SiO2, Si3N4
  • Quartz and Pyrex
  • InAlP, GaAs
  • SU8
  • No restriction except for polymers


Choose a drying equipment

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Wafer_and_sample_drying&oldid=16801"